Studies on Ultrathin Oxide and Oxynitride Gate Dielectric Films for Silicon Hetero-FETs

dc.contributor.author	Samanta, Santanu Kumar
dc.date.accessioned	2014-09-03T11:00:07Z
dc.date.available	2014-09-03T11:00:07Z
dc.date.issued	2003-09
dc.identifier.govdoc	NB12940
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/2466
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	Oxynitride Films	en
dc.subject	Ultrathin Oxide	en
dc.subject	Heterostructure	en
dc.subject	Optical Properties	en
dc.subject	Strained-Si	en
dc.subject	Transistor’s	en
dc.subject	p-channel	en
dc.subject	Heart	en
dc.subject	Alignment	en
dc.subject	Alloy Layers	en
dc.title	Studies on Ultrathin Oxide and Oxynitride Gate Dielectric Films for Silicon Hetero-FETs	en
dc.type	Thesis	en