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http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9355| Title: | Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications |
| Authors: | Das, Soumen |
| Keywords: | Sputtering Technique Grain Boundaries Potential Barrier Polyresisto Heavily Doped Polysihcon Oxide Isolated Monolithic Resistors Microelectronic Applications Trapping Models Eemission-based Poly Silicon Films |
| Issue Date: | 1-Mar-1995 |
| Publisher: | IIT, Kharagpur |
| Gov't Doc #: | NB11868 |
| URI: | http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9355 |
| Appears in Collections: | Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| NB11868_Abstract.pdf | 141.92 kB | Adobe PDF |  View/Open | |
| NB11868_Thesis.pdf Restricted Access | 5.25 MB | Adobe PDF | View/Open Request a copy |
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