Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications

Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9355

Full metadata record

DC Field	Value	Language
dc.contributor.author	Das, Soumen	-
dc.date.accessioned	2018-07-24T05:41:51Z	-
dc.date.available	2018-07-24T05:41:51Z	-
dc.date.issued	1995-03-01	-
dc.identifier.govdoc	NB11868	-
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9355	-
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	Sputtering Technique	en
dc.subject	Grain Boundaries	en
dc.subject	Potential Barrier	en
dc.subject	Polyresisto	en
dc.subject	Heavily Doped Polysihcon	en
dc.subject	Oxide Isolated Monolithic Resistors	en
dc.subject	Microelectronic Applications	en
dc.subject	Trapping Models	en
dc.subject	Eemission-based	en
dc.subject	Poly Silicon Films	en
dc.title	Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications	en
dc.type	Thesis	en
Appears in Collections:	Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications

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