Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9304
Title: Ultrathin Dielectrics on Sige/Sigec Layers for Heterostructure Mosfet Applications
Authors: Maikap, Siddheswar
Keywords: Ultrathin Dielectrics
Sige/Sigec Layers
Heterostructure Mosfet Applications
SiGe-Channel p-MOSFETs
Ultrathin Gate Oxides
Alloy Layers
MOS Capacitor Fabrication
Issue Date: 21-Aug-2001
Publisher: IIT, Kharagpur
Gov't Doc #: NB12824 ; NB12825
URI: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9304
Appears in Collections:Ultrathin Dielectrics on Sige/Sigec Layers for Heterostructure Mosfet Applications

Files in This Item:
File Description SizeFormat 
NB12824_Abstract.pdf120.59 kBAdobe PDFThumbnail
View/Open
NB12824_Thesis.pdf
  Restricted Access
5.93 MBAdobe PDFView/Open Request a copy


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.