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  4. Some Studies on Polycrystalline Silicon-Germanium Films, Silicides and Germanosilicides for Microelectronic Devices
Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/2503
Title: Some Studies on Polycrystalline Silicon-Germanium Films, Silicides and Germanosilicides for Microelectronic Devices
Authors: UMAPATHI, B.
Keywords: Germanosihcidi
Transformation
Agglomeration
Nucleation
Polymorphic
Ellipsometry
Modulation
Preamorphisation
Implantation
Polysihcon
Silicon-germamum
Sputtering
Salicide
Issue Date: 1999
Publisher: IIT Kharagpur
Gov't Doc #: NB12452
URI: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/2503
Appears in Collections:Some Studies on Polycrystalline Silicon-Germanium Films, Silicides and Germanosilicides for Microelectronic Devices

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