Plasma Grown Gate Dielectrics on Group-IV Alloy Layers for Silicon Heterostructure Devices

dc.contributor.author	Mahapatra, Rajat
dc.date.accessioned	2018-07-16T04:58:43Z
dc.date.available	2018-07-16T04:58:43Z
dc.date.issued	2004-09-01
dc.identifier.govdoc	NB13235
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9244
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	MOSFETs	en
dc.subject	MOS Devices	en
dc.subject	High-k Dielectrics	en
dc.subject	Alloy Heterostructures	en
dc.subject	CMOS Technology	en
dc.subject	n and p-channel	en
dc.title	Plasma Grown Gate Dielectrics on Group-IV Alloy Layers for Silicon Heterostructure Devices	en
dc.type	Thesis	en