Some Studies on Polycrystalline Silicon-Germanium Films, Silicides and Germanosilicides for Microelectronic Devices

dc.contributor.author	UMAPATHI, B.
dc.date.accessioned	2014-09-04T10:54:53Z
dc.date.available	2014-09-04T10:54:53Z
dc.date.issued	1999
dc.identifier.govdoc	NB12452
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/2503
dc.language.iso	en	en
dc.publisher	IIT Kharagpur	en
dc.subject	Germanosihcidi	en
dc.subject	Transformation	en
dc.subject	Agglomeration	en
dc.subject	Nucleation	en
dc.subject	Polymorphic	en
dc.subject	Ellipsometry	en
dc.subject	Modulation	en
dc.subject	Preamorphisation	en
dc.subject	Implantation	en
dc.subject	Polysihcon	en
dc.subject	Silicon-germamum	en
dc.subject	Sputtering	en
dc.subject	Salicide	en
dc.title	Some Studies on Polycrystalline Silicon-Germanium Films, Silicides and Germanosilicides for Microelectronic Devices	en
dc.type	Thesis	en