Surface Passivation and Gate-Dielectric Formation on Compound and Alloy Semiconductors

Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9324

Full metadata record

DC Field	Value	Language
dc.contributor.author	Pal, Suparna
dc.date.accessioned	2018-07-23T04:51:21Z
dc.date.available	2018-07-23T04:51:21Z
dc.date.issued	2003-07-25
dc.identifier.govdoc	NB12998 ; NB12999
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9324
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	Surface Passivation	en
dc.subject	Gate-Dielectric	en
dc.subject	Alloy Semiconductors	en
dc.subject	Compound Semiconductors	en
dc.subject	High-k Dielectric	en
dc.subject	MIS Devices	en
dc.subject	Semiconductor Surface	en
dc.title	Surface Passivation and Gate-Dielectric Formation on Compound and Alloy Semiconductors	en
dc.type	Thesis	en
Appears in Collections:	Surface Passivation and Gate-Dielectric Formation on Compound and Alloy Semiconductors

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