Please use this identifier to cite or link to this item:
http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/3958
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Biswas, Pranab | - |
dc.date.accessioned | 2015-06-29T10:58:37Z | - |
dc.date.available | 2015-06-29T10:58:37Z | - |
dc.date.issued | 2015-06-29T10:58:37Z | - |
dc.identifier.govdoc | NB15066 | - |
dc.identifier.uri | http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/3958 | - |
dc.language.iso | en | en |
dc.subject | DFT | en |
dc.subject | Hopping | en |
dc.subject | Charge Compensation | en |
dc.subject | Thermal Diffusion | en |
dc.title | Role of Thermally Diffused Arsenic from Semi-Insulating GaAs Substrate in Achieving p-TYPE Conductivity in MOCVD Grown ZnO | en |
dc.type | Thesis | en |
Appears in Collections: | Role of Thermally Diffused Arsenic from Semi-Insulating GaAs Substrate in Achieving p-TYPE Conductivity in MOCVD Grown ZnO |
Files in This Item:
File | Description | Size | Format | |
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NB15066_Thesis.pdf Restricted Access | 4.36 MB | Adobe PDF | View/Open Request a copy | |
NB15066A_bstract.pdf | 58.85 kB | Adobe PDF | ![]() View/Open |
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