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  4. Nickel Based Thin Films and Nanocrystals for Silicided Junctions and Memory Devices
Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/14178
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dc.contributor.authorPanda, Debashis-
dc.date.accessioned2024-05-09T12:53:09Z-
dc.date.available2024-05-09T12:53:09Z-
dc.date.issued2011-05-
dc.identifier.govdocNB14387-
dc.identifier.urihttp://www.idr.iitkgp.ac.in/xmlui/handle/123456789/14178-
dc.language.isoenen_US
dc.publisherIIT Kharagpuren_US
dc.subjectTernary Cobalt-Nickel Silicideen_US
dc.subjectNonvolatile Memoryen_US
dc.subjectSchottky Diodeen_US
dc.subjectNanocrystal Flash Memoryen_US
dc.subjectResistive Switching Memoryen_US
dc.titleNickel Based Thin Films and Nanocrystals for Silicided Junctions and Memory Devicesen_US
dc.typeThesisen_US
Appears in Collections:Nickel Based Thin Films and Nanocrystals for Silicided Junctions and Memory Devices

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