Please use this identifier to cite or link to this item: http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/14071
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dc.contributor.authorSaha, Chumki-
dc.date.accessioned2024-05-07T10:50:03Z-
dc.date.available2024-05-07T10:50:03Z-
dc.date.issued2000-04-
dc.identifier.govdocNB12531-
dc.identifier.urihttp://www.idr.iitkgp.ac.in/xmlui/handle/123456789/14071-
dc.language.isoenen_US
dc.publisherIIT Kharagpuren_US
dc.subjectPolysiliconen_US
dc.subjectSilicon-Germaniumen_US
dc.subjectThermal Oxidationen_US
dc.subjectR.M.S. Roughnessen_US
dc.subjectIon Beam Sputteringen_US
dc.titleIon Assisted Processing of Polycrystalline Silicon, Silicon Germanium Films and Their Oxidesen_US
dc.typeThesisen_US
Appears in Collections:Ion Assisted Processing of Polycrystalline Silicon, Silicon Germanium Films and Their Oxides

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