dc.contributor.author | Das, Soumen | |
dc.date.accessioned | 2018-07-24T05:41:51Z | |
dc.date.available | 2018-07-24T05:41:51Z | |
dc.date.issued | 1995-03-01 | |
dc.identifier.govdoc | NB11868 | |
dc.identifier.uri | http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9355 | |
dc.language.iso | en | en |
dc.publisher | IIT, Kharagpur | en |
dc.subject | Sputtering Technique | en |
dc.subject | Grain Boundaries | en |
dc.subject | Potential Barrier | en |
dc.subject | Polyresisto | en |
dc.subject | Heavily Doped Polysihcon | en |
dc.subject | Oxide Isolated Monolithic Resistors | en |
dc.subject | Microelectronic Applications | en |
dc.subject | Trapping Models | en |
dc.subject | Eemission-based | en |
dc.subject | Poly Silicon Films | en |
dc.title | Large-Bias Conduction and High-Current Induced Effects in Ion-Beam-Sputtered Polysilicon Films for Microelectronic Applications | en |
dc.type | Thesis | en |