Ultrathin Dielectrics on Sige/Sigec Layers for Heterostructure Mosfet Applications

dc.contributor.author	Maikap, Siddheswar
dc.date.accessioned	2018-07-18T12:05:23Z
dc.date.available	2018-07-18T12:05:23Z
dc.date.issued	2001-08-21
dc.identifier.govdoc	NB12824 ; NB12825
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/9304
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	Ultrathin Dielectrics	en
dc.subject	Sige/Sigec Layers	en
dc.subject	Heterostructure Mosfet Applications	en
dc.subject	SiGe-Channel p-MOSFETs	en
dc.subject	Ultrathin Gate Oxides	en
dc.subject	Alloy Layers	en
dc.subject	MOS Capacitor Fabrication	en
dc.title	Ultrathin Dielectrics on Sige/Sigec Layers for Heterostructure Mosfet Applications	en
dc.type	Thesis	en