Studies on High-k Gate Dielectric Films on Strained-SiGe Heterolayers

dc.contributor.author	Chatterjee, Somenath
dc.date.accessioned	2017-09-08T06:51:29Z
dc.date.available	2017-09-08T06:51:29Z
dc.date.issued	2003-09-01
dc.identifier.govdoc	NB12996
dc.identifier.govdoc	NB12995
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/8285
dc.language.iso	en	en
dc.publisher	IIT, Kharagpur	en
dc.subject	High-k Materials	en
dc.subject	MOS Capacitors	en
dc.subject	Gate Dielectrics	en
dc.subject	TOFSIMS Analysis	en
dc.subject	XPS Analysis	en
dc.title	Studies on High-k Gate Dielectric Films on Strained-SiGe Heterolayers	en
dc.type	Thesis	en