IDR - IIT Kharagpur

Growth and Characterization of HFCYD Grown Tungsten Oxide Thin Films and Nanostructures

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dc.contributor.author Pal, Samik
dc.date.accessioned 2017-05-08T05:55:35Z
dc.date.available 2017-05-08T05:55:35Z
dc.date.issued 2006-09-01
dc.identifier.govdoc NB13430
dc.identifier.uri http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/7560
dc.language.iso en en
dc.publisher IIT ,Kharagpur en
dc.subject Tungsten Filament en
dc.subject Gas Sensors en
dc.subject Thin Films en
dc.subject Tungsten Oxide en
dc.subject HFCVD en
dc.subject Nanostructures en
dc.subject Electrochromic Devices en
dc.title Growth and Characterization of HFCYD Grown Tungsten Oxide Thin Films and Nanostructures en
dc.type Thesis en


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