Low Frequency Noise Characterization and Modeling of Strain-Engineered Mosfets

dc.contributor.author	Mukherjee, Chhandak
dc.date.accessioned	2014-08-22T11:13:43Z
dc.date.available	2014-08-22T11:13:43Z
dc.date.issued	2013-03
dc.identifier.govdoc	NB14844
dc.identifier.uri	http://www.idr.iitkgp.ac.in/xmlui/handle/123456789/2229
dc.language.iso	en	en
dc.publisher	IIT Kharagpur	en
dc.subject	Valence Band	en
dc.subject	Strain-induced Mobility	en
dc.subject	Tri-gate	en
dc.subject	Substrate-induced	en
dc.subject	Piezoresistive	en
dc.subject	Power spectrum	en
dc.subject	Probability distribution	en
dc.subject	Carrier Mobility	en
dc.subject	Gate Voltage	en
dc.subject	Scaling	en
dc.subject	Electronic Circuits	en
dc.subject	Reliability	en
dc.subject	Stress-Strain	en
dc.subject	Silicon	en
dc.subject	Conduction	en
dc.title	Low Frequency Noise Characterization and Modeling of Strain-Engineered Mosfets	en
dc.type	Thesis	en